Please use this identifier to cite or link to this item:

Title: Phenol removal onto novel activated carbons made from lignocellulosic precursors: Influence of surface properties
Authors: Valente Nabais, Joao
Gomes, Jose
Suhas, Suhas
Carrott, Peter
Laginhas, Carlos
Roman, Silvia
Keywords: activated carbons
Issue Date: 2009
Publisher: Journal of Hazardous Materials
Citation: Journal of Hazardous Materials 167 (2009) 904–910
Abstract: The adsorption of phenol from dilute aqueous solutions onto new activated carbons (AC) was studied. The novel activated carbon was produced from lignocellulosic (LC) precursors of rapeseed and kenaf. Samples oxidised with nitric acid in liquid phasewere also studied. The results have shown the significant potential of rapeseed and kenaf for the activated carbon production. The activated carbons produced by carbon dioxide activation were mainly microporous with BET apparent surface area up to 1350m2 g−1 and pore volume 0.5cm3 g−1. The effects of concentration (0.1–2mM) and pH (3–13) were studied. The phenol adsorption isotherms at 25 ◦C followed the Freundlichmodel withmaximumadsorption capacities of approximately 80 and 50mgg−1 for the pristine and oxidised activated carbons, respectively. The influence of pH on the adsorption has two trends for pH below and above 10. It was possible to conclude that when phenol is predominantly in the molecular form the most probable mechanism is based on the – dispersion interaction between the phenol aromatic ring and the delocalised electrons present in the activated carbon aromatic structure. When phenolate is the major component the electrostatic repulsion that occurs at high pH values is the most important aspect of the adsorption mechanism.
Type: article
Appears in Collections:CQE - Publicações - Artigos em Revistas Internacionais Com Arbitragem Científica

Files in This Item:

File Description SizeFormat
Journal of Hazardous Materials 167 (2009) 904–910.pdf144.32 kBAdobe PDFView/Open
FacebookTwitterDeliciousLinkedInDiggGoogle BookmarksMySpaceOrkut
Formato BibTex mendeley Endnote Logotipo do DeGóis 

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.


Dspace Dspace
DSpace Software, version 1.6.2 Copyright © 2002-2008 MIT and Hewlett-Packard - Feedback
UEvora B-On Curriculum DeGois